Description
A clear calmed, blemish-free complexion. Powered by colloidal sulfur, bentonite clay, and kaolin clay, this non-drying, purifying mask treats acne, absorbs excess oil, and prevents future breakouts. Phenylethyl resorcinol and zinc oxide work together to help relieve redness while reducing the appearance of acne scars and imperfections. Aloe helps soothe irritated skin. This acne-fighting mask can be used as a spot treatment or overnight mask for noticeably clearer, more balanced skin.
Ingredients
ACTIVE INGREDIENTS: Sulfur 5.0% (Purpose: Acne Treatment)
- Colloidal Sulfur works quickly to neutralize acne bacteria and balance excess sebum production to treat blemishes. It efficiently exfoliates dead skin cells, unblocks pores, and dissolves impurities for a clear complexion.
- Bentonite Clay has the ability to absorb more than its own mass to powerfully draw out excess oils and toxins from the skin.
- Kaolin Clay is a gentle, fine-grained clay that mildly exfoliates to reverse dryness and dullness. It also absorbs excess oil for a mattified skin appearance.
INACTIVE INGREDIENTS: Water/Aqua/Eau, Kaolin, Cetearyl Alcohol, Glycerin, Polysorbate 20, Butylene Glycol, Acacia Senegal Gum, Zinc Oxide, Bentonite, Carthamus Tinctorius (Safflower) Seed Oil, Farnesol, Opuntia Tuna Flower/Stem Extract, Salix Alba (Willow) Bark Extract, Bisabolol, Retinol, Phenylethyl Resorcinol, Glycyrrhiza Glabra (Licorice) Root Extract, Aloe Barbadensis Leaf Juice, Tocopheryl Acetate, Glycine Soja (Soybean) Oil, Sodium PCA, Ethylhexylglycerin, Allantoin, Rosmarinus Officinalis (Rosemary) Leaf Oil, Phenoxyethanol, Sodium Benzoate, Potassium Sorbate.
Instructions
Clean the skin thoroughly before applying this product. Cover the entire affected area with a thin layer of the mask, one to three times daily. Leave on for at least 10 minutes, then rinse. For use as a deeper treatment, apply a thicker layer to the targeted area as a spot treatment or as an overnight mask and wash off in the morning. Suitable for use on the face, chest, and back.